Block copolymer (BCP) self‐assembly (SA) can be exploited for next‐generation lithography
for the advanced nanopatterning of surfaces with versatile nanoscale features. To render …

The reliable and regular modification of the surface properties of substrates plays a crucial
role in material research and the development of functional surfaces. A key aspect of this is …

We investigated the dewetting process on flat and chemically patterned surfaces of ultrathin
films (thickness between 2 and 15 nm) of a cylinder forming polystyrene-block-poly (methyl …

Nanolithography with self‐assembled block copolymers (BCPs) is an emerging competitive
alternative to conventional lithography, which is currently reaching its limits with regard to …

The continuous and aggressive scaling in semiconductor technology results in the
integration of increasingly complex 3D architectures and new materials. The realization of …

Block copolymer lithography allows for the large-area patterning of surfaces with self-
assembled nanoscale features. The created nanostructured polymer films can be applied as …

Block copolymer (BCP) self-assembly processes are often seen as reliable techniques for
advanced nanopatterning to achieve functional surfaces and create templates for …

Patterned nanostructure materials have important applications in photonic crystals, SERS,
micro/nanodevices etc [1]. Conventional nanofabrication technologies for the patterned …

Various nanostructures, such as nanopillars and nanoholes, have served as vital functional
components for construction of high-performance electronic and photonic devices. Precise …

Silicon nano-texture, also referred to as black silicon, has excellent light trapping properties
and is a potential solution to overcome optical losses in silicon solar cell. However …