Reliability of HfO2-Based Ferroelectric FETs: A Critical Review of Current and Future Challenges

N Zagni, FM Puglisi, P Pavan… - Proceedings of the …, 2023 - ieeexplore.ieee.org
Ferroelectric transistors (FeFETs) based on doped hafnium oxide (HfO2) have received
much attention due to their technological potential in terms of scalability, high-speed, and …

A perspective on steep-subthreshold-slope negative-capacitance field-effect transistor

M Kobayashi - Applied Physics Express, 2018 - iopscience.iop.org
In today's highly information-oriented society, a continuously increasing number of
computing devices are needed in the Internet-of-Things (IoT) era, from high-end servers in …

Ferroelectric HfZrOx Ge and GeSn PMOSFETs with Sub-60 mV/decade subthreshold swing, negligible hysteresis, and improved Ids

J Zhou, G Han, Q Li, Y Peng, X Lu… - 2016 IEEE …, 2016 - ieeexplore.ieee.org
We report the first ferroelectric (FE) HfZrO x (HZO) Ge and GeSn pMOSFETs with sub-60
mV/decade subthreshold swing (SS)(40~ 43 mV/decade), negligible hysteresis, and …

Analysis and compact modeling of negative capacitance transistor with high ON-current and negative output differential resistance—Part II: Model validation

G Pahwa, T Dutta, A Agarwal… - … on Electron Devices, 2016 - ieeexplore.ieee.org
In this paper, we show a validation of our compact model for negative capacitance FET
(NCFET) presented in Part I. The model is thoroughly validated with the TCAD simulations …

Compact model for ferroelectric negative capacitance transistor with MFIS structure

G Pahwa, T Dutta, A Agarwal… - IEEE Transactions on …, 2017 - ieeexplore.ieee.org
We present a physics-based compact model for a ferroelectric negative capacitance FET
(NCFET) with a metal-ferroelectric-insulator-semiconductor (MFIS) structure. The model is …

Ferroelectric field effect transistors (FeFETs): advancements, challenges and exciting prospects for next generation non-volatile memory (NVM) applications

J Ajayan, P Mohankumar, D Nirmal… - Materials Today …, 2023 - Elsevier
Data intensive applications such as AI (Artificial Intelligence) and IoT (Internet of Things)
demand high performance and highly reliable non-volatile memories (NVM). FeFET offers …

Evaluation of negative capacitance ferroelectric MOSFET for analog circuit applications

Y Li, Y Kang, X Gong - IEEE Transactions on Electron Devices, 2017 - ieeexplore.ieee.org
Negative capacitance ferroelectric (FE) field-effect transistor (FeFET) is promising to address
the issue of the increasing power density in digital circuit by realizing sub-60 mV/decade …

Review of ferroelectric field‐effect transistors for three‐dimensional storage applications

HW Park, JG Lee, CS Hwang - Nano Select, 2021 - Wiley Online Library
The ferroelectric field‐effect transistor (FeFET) is one of the leading contenders to succeed
charge‐trap‐based flash memory (CTF) devices in the current vertically‐integrated NAND …

Ferroelectric negative capacitance GeSn PFETs with sub-20 mV/decade subthreshold swing

J Zhou, G Han, Y Peng, Y Liu, J Zhang… - IEEE Electron …, 2017 - ieeexplore.ieee.org
Negative capacitance (NC) GeSn pFETs integrated with HfZrO x (HZO) ferroelectric film is
demonstrated with sub-20 mV/decade subthreshold swing (SS) over two orders of …

Stability constraints define the minimum subthreshold swing of a negative capacitance field-effect transistor

A Jain, MA Alam - IEEE Transactions on Electron Devices, 2014 - ieeexplore.ieee.org
The current-voltage characteristics of a classical field-effect transistor (FET) is dictated by
thermal injection of charge carriers over a gate-controlled energy barrier. It is well known …