Atomic-scale silicon etching control using pulsed Cl2 plasma
C Petit-Etienne, M Darnon, P Bodart… - Journal of Vacuum …, 2013 - pubs.aip.org
Plasma etching has been a key driver of miniaturization technologies toward smaller and
more powerful devices in the semiconductor industry. Thin layers involved in complex stacks …
more powerful devices in the semiconductor industry. Thin layers involved in complex stacks …
[引用][C] Atomic-scale silicon etching control using pulsed Cl-2 plasma
C Petit-Etienne, M Darnon, P Bodart… - Journal of Vacuum …, 2013 - hal.univ-grenoble-alpes.fr
Atomic-scale silicon etching control using pulsed Cl-2 plasma - Université Grenoble Alpes
Accéder directement au contenu Documentation FR Se connecter Portail HAL UGA …
Accéder directement au contenu Documentation FR Se connecter Portail HAL UGA …
[引用][C] Atomic-scale silicon etching control using pulsed Cl2 plasma
C Petit-Etienne, M Darnon, P Bodart… - Journal of Vacuum …, 2013 - ui.adsabs.harvard.edu
Atomic-scale silicon etching control using pulsed Cl2 plasma - NASA/ADS Now on home page
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[PDF][PDF] Atomic-scale silicon etching control using pulsed Cl2 plasma
C Petit-Etienne, M Darnon, P Bodart… - Journal of Vacuum …, 2013 - researchgate.net
Plasma etching has been a key driver of miniaturization technologies toward smaller and
more powerful devices in the semiconductor industry. Thin layers involved in complex stacks …
more powerful devices in the semiconductor industry. Thin layers involved in complex stacks …
Atomic-scale silicon etching control using pulsed Cl2 plasma
C Petit-Etienne, M Darnon, P Bodart… - Journal of Vacuum …, 2013 - pubs.aip.org
Plasma etching has been a key driver of miniaturization technologies toward smaller and
more powerful devices in the semiconductor industry. Thin layers involved in complex stacks …
more powerful devices in the semiconductor industry. Thin layers involved in complex stacks …
[PDF][PDF] Atomic-scale silicon etching control using pulsed Cl2 plasma
C Petit-Etienne, M Darnon, P Bodart… - Journal of Vacuum …, 2013 - academia.edu
Plasma etching has been a key driver of miniaturization technologies toward smaller and
more powerful devices in the semiconductor industry. Thin layers involved in complex stacks …
more powerful devices in the semiconductor industry. Thin layers involved in complex stacks …
[引用][C] Atomic-scale silicon etching control using pulsed Cl-2 plasma
C Petit-Etienne, M Darnon, P Bodart… - Journal of Vacuum …, 2013 - hal.science
Atomic-scale silicon etching control using pulsed Cl-2 plasma - Archive ouverte HAL Accéder
directement au contenu Documentation FR Français (FR) Anglais (EN) Se connecter HAL …
directement au contenu Documentation FR Français (FR) Anglais (EN) Se connecter HAL …
[引用][C] Atomic-scale silicon etching control using pulsed Cl-2 plasma
C Petit-Etienne, M Darnon, P Bodart… - Journal of Vacuum …, 2013 - hal.univ-grenoble-alpes.fr
Atomic-scale silicon etching control using pulsed Cl-2 plasma - Université Grenoble Alpes
Accéder directement au contenu Documentation FR Se connecter Portail HAL UGA …
Accéder directement au contenu Documentation FR Se connecter Portail HAL UGA …
[PDF][PDF] Atomic-scale silicon etching control using pulsed Cl2 plasma
C Petit-Etienne, M Darnon, P Bodart… - Journal of Vacuum …, 2013 - academia.edu
Plasma etching has been a key driver of miniaturization technologies toward smaller and
more powerful devices in the semiconductor industry. Thin layers involved in complex stacks …
more powerful devices in the semiconductor industry. Thin layers involved in complex stacks …
[PDF][PDF] Atomic-scale silicon etching control using pulsed Cl2 plasma
C Petit-Etienne, M Darnon, P Bodart, M Fouchier… - researchgate.net
Plasma etching has been a key driver of miniaturization technologies toward smaller and
more powerful devices in the semiconductor industry. Thin layers involved in complex stacks …
more powerful devices in the semiconductor industry. Thin layers involved in complex stacks …
