Etching characteristics of TiN used as hard mask in dielectric etch process

T Chevolleau, D Eon, L Vallier, J Torres… - Journal of Vacuum …, 2006 - pubs.aip.org
This study focuses on the etching characteristics of a TiN hard mask in terms of etch rate and
faceting when using a dielectric etch process. The etching experiments have been …
被引用次数：48 相关文章

Etching characteristics of TiN used as hard mask in dielectric etch process

M Darnon, T Chevolleau, D Eon, L Vallier… - Journal of Vacuum …, 2006 - pubs.aip.org
This study focuses on the etching characteristics of a TiN hard mask in terms of etch rate and
faceting when using a dielectric etch process. The etching experiments have been …

[引用][C] Etching characteristics of TiN used as hard mask in dielectric etch process

M Darnon, T Chevolleau, D Eon… - Journal of Vacuum …, 2006 - ui.adsabs.harvard.edu
Etching characteristics of TiN used as hard mask in dielectric etch process - NASA/ADS Now
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[引用][C] Etching characteristics of TiN used as hard mask in dielectric etch process

M Darnon, T Chevolleau, D Eon, L Vallier… - Journal of Vacuum …, 2006 - cir.nii.ac.jp
Etching characteristics of TiN used as hard mask in dielectric etch process | CiNii Research
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[引用][C] Etching characteristics of TiN used as hard mask in dielectric etch process

M Darnon, T Chevolleau, D Eon, L Vallier, J Torres… - J. Vac. Sc …, 2006 - hal.science
Etching characteristics of TiN used as hard mask in dielectric etch process - Archive ouverte HAL
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[引用][C] Etching characteristics of TiN used as hard mask in dielectric etch process

M Darnon, T Chevolleau, D Eon… - J. Vac. Sc …, 2006 - hal.univ-grenoble-alpes.fr
Etching characteristics of TiN used as hard mask in dielectric etch process - Université
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[引用][C] Etching characteristics of TiN used as hard mask in dielectric etch process

M Darnon, T Chevolleau, D Eon… - J. Vac. Sc …, 2006 - hal.univ-grenoble-alpes.fr
Etching characteristics of TiN used as hard mask in dielectric etch process - Université
Grenoble Alpes Accéder directement au contenu Documentation FR Se connecter Portail …

[引用][C] Etching characteristics of TIN used as hard mask in dielectric etch process

M DARNON, T CHEVOLLEAU… - Journal of vacuum …, 2006 - American Institute of Physics