Time-resolved ion flux, electron temperature and plasma density measurements in a pulsed Ar plasma using a capacitively coupled planar probe

M Darnon, G Cunge… - Plasma Sources Science …, 2014 - iopscience.iop.org
The resurgence of industrial interest in pulsed radiofrequency plasmas for etching
applications highlights the fact that these plasmas are much less well characterized than …
被引用次数：28 相关文章

Time-resolved ion flux, electron temperature and plasma density measurements in a pulsed Ar plasma using a capacitively coupled planar probe

M Darnon, G Cunge, NSJ Braithwaite - Plasma Sources Science and …, 2014 - osti.gov
The resurgence of industrial interest in pulsed radiofrequency plasmas for etching
applications highlights the fact that these plasmas are much less well characterized than …

[引用][C] Time-resolved ion flux, electron temperature and plasma density measurements in a pulsed Ar plasma using a capacitively coupled planar probe

M Darnon, G Cunge, NSJ Braithwaite - Plasma Sources Science and …, 2014 - hal.science
Time-resolved ion flux, electron temperature and plasma density measurements in a pulsed
Ar plasma using a capacitively coupled planar probe - Archive ouverte HAL Accéder …

Time-resolved ion flux, electron temperature and plasma density measurements in a pulsed Ar plasma using a capacitively coupled planar probe

M Darnon, G Cunge, NSJ Braithwaite - Plasma Sources Science and …, 2014 - inis.iaea.org
[en] The resurgence of industrial interest in pulsed radiofrequency plasmas for etching
applications highlights the fact that these plasmas are much less well characterized than …

Time-resolved ion flux, electron temperature and plasma density measurements in a pulsed Ar plasma using a capacitively coupled planar probe

M Darnon, G Cunge… - Plasma Sources Science …, 2014 - ui.adsabs.harvard.edu
The resurgence of industrial interest in pulsed radiofrequency plasmas for etching
applications highlights the fact that these plasmas are much less well characterized than …

Time-resolved ion flux, electron temperature and plasma density measurements in a pulsed Ar plasma using a capacitively coupled planar probe

M Darnon, G Cunge, NSJ Braithwaite - Plasma Sources Science …, 2014 - oro.open.ac.uk
The resurgence of industrial interest in pulsed radiofrequency plasmas for etching
applications highlights the fact that these plasmas are much less well characterized than …