Electrodeposition of Au for self-assembling 3D microstructures

ME Kiziroglou, AG Mukherjee… - Micromachining …, 2008 - spiedigitallibrary.org
Rotation of structures fabricated by planar processing into out-of-plane orientations can be
used to greatly increase the 3-dimensionality of microstructures. Previously this has been …

Demonstration of three-dimensional microstructure self-assembly

PW Green, RRA Syms… - Journal of …, 1995 - ieeexplore.ieee.org
Self-assembly of three-dimensional microstructures using the surface tension force of molten
solder to produce out-of-plane rotation is demonstrated. The generic nature of the technique …

[PDF][PDF] Electrochemical Microfabrication for High-Aspect Ratio 3-D Microstructures

G Zhang - Journal of Applied Surface Finishing, 2006 - nmfrc.org
MEMS (Microelectromechanical Systems) or MST (Microsystem Technology) have been
widely recognized as the next technology revolution that will remarkably change human …

Conductive interconnections through thick silicon substrates for 3D packaging

T Takizawa, S Yamamoto, K Itoi… - … Digest. MEMS 2002 …, 2002 - ieeexplore.ieee.org
We have developed key technologies to form conductive interconnections through a thick
silicon substrate, which are potentially applied for 3D device fabrication or packaging of …

Surface tension powered self-assembly of 3D MOEMS devices using DRIE of bonded silicon-on-insulator wafers

RRA Syms, C Gormley, S Blackstone - 2000 - IET
Surface tension powered self-assembly is a technique for mass parallel fabrication of 3D
micro-electro-mechanical systems (MEMS) from surface micromachined parts, which are …

Electrodeposition-based 3D Printing of Metallic Microarchitectures with Controlled Internal Structures.

SK Seol, D Kim, S Lee, JH Kim… - Small (Weinheim an …, 2015 - europepmc.org
3D printing of metallic microarchitectures with controlled internal structures is realized at
room temperature in ambient air conditions by the manipulation of metal ion concentration …

Fabrication of very-high-aspect-ratio microstructures in complex patterns by photoelectrochemical etching

G Sun, X Zhao - Journal of Microelectromechanical Systems, 2012 - ieeexplore.ieee.org
We have fabricated very-high-aspect-ratio (VHAR) silicon and metal microstructures in
complex geometric patterns. The recently developed surfactant-added …

Monolithic integration of 3-D electroplated microstructures with unlimited number of levels using planarization with a sacrificial metallic mold (PSMM)

JB Yoon, CH Han, E Yoon… - Technical Digest. IEEE …, 1999 - ieeexplore.ieee.org
A new monolithic integration method for 3-D electroplated microstructures of unlimited
number of levels has been developed using unique planarization with a sacrificial metallic …

Fabrication of microstructures by wet etching of anodic aluminum oxide substrates

SE Jee, PS Lee, BJ Yoon, SH Jeong… - Chemistry of …, 2005 - ACS Publications
Anodic aluminum oxide (AAO) was used as substrates of microstructure fabrication.
Complex structures with high aspect ratios were obtained by the single-step wet etching of …

A single mask process for the realization of fully-isolated, dual-height MEMS metallic structures separated by narrow gaps

Y Li, M Kim, MG Allen - Journal of Micromechanics and …, 2018 - iopscience.iop.org
Multi-height metallic structures are of importance for various MEMS applications, including
master molds for creating 3D structures by nanoimprint lithography, or realizing vertically …