The use promising group III-V materials for photovoltaic applications is hindered by the high density of threading dislocations when integrated with silicon technology. Here, we present …
Today's photovoltaics market is dominated by silicon-based technology, as it is inexpensive and mature. Solar cells (SCs) based on III-V compound semiconductors have attained the …
YA Bioud, A Boucherif, M Myronov… - ECS …, 2019 - iopscience.iop.org
High-quality germanium epilayers on Si with low threadingdislocation densities are achieved by self-assembling nanovoids inside the Ge layer. This consists on the formation of …
III-V solar cell cost reduction and direct III-V/Si integration can both be realized by depositing a thin layer of high-quality Ge on relatively low-cost Si substrates. However, direct epitaxial …
Multijunction solar cells (MJSC) currently hold the highest efficiency on the market. However, their widespread in terrestrial applications is getting held back by the high devices cost. A …
A comparison between the crystalline quality of Ge grown on bulk Si and on a low porosity porous Si (pSi) buffer layer using low energy plasma enhanced chemical vapor deposition is …
A low-cost method to reduce the threading dislocations density (TDD) in relaxed germanium (Ge) epilayers grown on silicon (Si) substrates is presented. Ge/Si substrate was treated with …
R Ginige, B Corbett, M Modreanu… - Semiconductor …, 2006 - iopscience.iop.org
A virtual substrate consisting of a Ge layer grown directly on Si without an intervening SiGe graded layer is characterized. The nominally 100% Ge overlayer is fully relaxed and …
High-quality germanium (Ge) epilayers on silicon (Si) with low threading dislocation density were achieved by sintering of porous Si/Ge films. The process consists of the formation of …