Changes in the ion flux and the time-averaged ion distribution functions are reported for
pulsed, inductively coupled RF plasmas (ICPs) operated over a range of duty cycles. For …

Inductively coupled plasmas ICP are being investigated for use as sources for etching of
dielectrics and metals for semiconductor microelectronics fabrication. 1–9 ICP reactors …

The characteristics of pulse-modulated inductively coupled plasmas in argon and chlorine
have been experimentally investigated. Measurements were performed for peak rf powers …

In pulse-modulated inductively coupled plasmas generated in CF 4: Ar mixtures, a transition
between a capacitive coupling mode (E mode) and an inductive coupling mode (H mode) …

Time resolved current and voltage measurements have been made on a pulsed radio
frequency (rf) inductively coupled plasma (ICP) at 13.56 MHz in argon. Measurements were …

Laser induced fluorescence has been used to measure the temperature, radial drift velocity,
and relative number density of metastable chlorine ions, Cl+*, in inductively coupled …

Atomic clocks that fly on global-navigation satellites such as global positioning system (GPS)
and Galileo employ light from low-temperature, inductively coupled plasmas (ICPs) for …

Pulsed inductively coupled plasmas (ICPs) sustained in electronegative gas mixtures using
a substrate bias are being investigated to achieve improved etching characteristics in …

Low pressure inductively coupled plasmas (ICP) operated in neon at 27.12 MHz with
capacitive substrate biasing (CCP) at 13.56 MHz are investigated by phase resolved optical …

We report a systematic study of a pulsed 13.56 MHz transformer-coupled plasma over a
range of frequencies from 200 Hz to 10 kHz using electrostatic probes. The time-resolved …