The resurgence of industrial interest in pulsed radiofrequency plasmas for etching
applications highlights the fact that these plasmas are much less well characterized than …

Transient plasmas (such as pulsed power plasmas) can be of interest to both industry,
where they allow for new processing windows, and basic science, where their dynamics are …

Radio frequency inductively coupled plasma sources are widely used in low temperature
industrial processing. Recent computer simulations and experiments indicate significant …

The total current or flux of ions striking the substrate is an important parameter that must be
tightly controlled during plasma processing. Several methods have recently been proposed …

Time-resolved ion flux and energy distributions were measured at an electrode located
adjacent to a pulsed, electron beam-generated plasma produced in argon. A Langmuir …

To obtain optimal results from plasma processing, the energy of ions incident on substrate
wafers must be carefully controlled. Such control has been difficult to achieve, however …

Time‐resolved cross‐sectional variation of plasma potential and electron energies were
measured in a parallel‐plate capacitively coupled argon discharge at 400 mTorr. Movable …

There is much interest in scaling rf-excited capacitively coupled plasma reactors to larger
sizes and to higher frequencies. As the size approaches operating wavelength, concerns …

Using a Langmuir probe, time resolved measurements of plasma parameters were carried
out in a discharge produced by a pulsed dual frequency inductively coupled plasma source …

This paper describes a three-harmonic active probe compensation technique, developed for
obtaining time-resolved plasma parameter measurements in pulsed, low-pressure, RF …