Using time-resolved optical-pump terahertz-probe spectroscopy, we study the ultrafast carrier dynamics in In 0.53 Ga 0.47 As: ErAs, a potential candidate for 1550 nm based …
Y Chen, SS Prabhu, SE Ralph, DT McInturff - Applied physics letters, 1998 - pubs.aip.org
We have observed a long-lived residual photoconductivity in low-temperature-grown (LT) InGaAs. These results have significant consequences for devices comprised of LT-InGaAs …
Through the recrystallization of an amorphous heterostructure, obtained by MeV Fe ion implantation, we are able to tailor a standard epitaxial semiconductor material, a small gap …
We propose an Fe-doped, InGaAs-based semiconductor heterostructure optimized for the application as an ultrafast photoconductor and investigate its optical as well as THz …
M Martin, ER Brown, J Mangeney… - 2012 37th …, 2012 - ieeexplore.ieee.org
We compare the photocarrier lifetime measured in Br-irradiated InGaAs and cold Fe- implanted InGaAsP. We also demonstrate the possibility of a two-photon absorption (TPA) …
A multiple-energy, high fluence, MeV Fe ion implantation process was applied at 83 K to heavily damage a low band gap (0.79 eV) epitaxial InGaAsP layer. Optimal rapid thermal …
The properties of rhodium (Rh) as a deep-level dopant in InGaAs lattice matched to InP grown by molecular beam epitaxy are investigated. When InGaAs: Rh is used as an ultrafast …
M Sukhotin, ER Brown, D Driscoll, M Hanson… - Applied physics …, 2003 - pubs.aip.org
This letter reports the measurement of photocarrier lifetime in ErAs: InGaAs epitaxial material grown on InP substrates. The measurement technique is ultrafast time-resolved …
S Marcinkevicius, C Carmody… - Ultrafast …, 2004 - spiedigitallibrary.org
Heavy ion implantation into InP and In 0.53 Ga 0.47 As and rapid thermal annealing has been applied to produce materials with high resistivity, good mobility and ultrashort carrier …