Plasma etching has been a key driver of miniaturization technologies toward smaller and
more powerful devices in the semiconductor industry. Thin layers involved in complex stacks …

In recent years, laser-controlled dry-etching proc~ es have been investigated for a wide
variety of applications in microfabrication. I-3 The use of lasers to influence the etch process …

Power-modulated (pulsed) plasmas have demonstrated several advantages compared to
continuous wave (CW) plasmas. Specifically, pulsed plasmas can result in a higher etching …

Dry etching is a prevalent technique for pattern transfer and material removal in
microelectronics, optics and photonics due to its high precision material removal with low …

Pulsed plasmas are promising candidates to go beyond limitations of continuous waves'
plasma. However, their interaction with surfaces remains poorly understood. The authors …

Sub-nm precision is increasingly being required of many critical plasma etching processes
in the semiconductor industry. Accurate control over ion energy and ion/radical composition …

There has been a steady increase in sub-nm precision requirement for many critical plasma
etching processes in the semiconductor industry. In addition to high selectivity and low …

Plasma etching is the most standard patterning technology used in micro-and nano-
technologies. Chlorine-based plasmas are often used for silicon etching. However, the …

Plasma atomic layer etching is a dry etching process using a dose step to modify a material's
surface chemistry and an etch step to remove the modified surface layer. This method of …

With the emergence of new semiconductor devices and architectures, there is a real need to
limit plasma induced damage. This study clearly demonstrates the capability of pulsed …