Next‐generation lithography techniques based on the self‐assembly of block copolymers
(BCPs) are promising methods for high‐resolution pattering. BCPs with a high …

The continuous demand for small portable electronics is pushing the semiconductor industry
to develop novel lithographic methods to fabricate the elementary structures for …

Directed self-assembly (DSA) of block copolymers (BCPs) is a promising approach for the
fabrication of sub-10 nm features. Although a variety of BCPs allow the feature size down to …

As an emerging developing technique for next-generation lithography, directed self-
assembly (DSA) of block copolymer (BCP) has attracted numerous attention and has been a …

The directed self-assembly (DSA) of block co-polymers (BCPs) can realize next-generation
lithography for semiconductors and a variety of soft materials. It is imperative to …

This work presents the graphoepitaxy of high-χ block copolymers (BCP) in standard industry-
like lithography stacks and their transfer into the silicon substrate The process includes …

Directed self-assembly (DSA) of block copolymers (BCPs) combines advantages of
conventional photolithography and polymeric materials and shows competence in …

Thermal scanning probe lithography (t-SPL) is applied to the fabrication of chemical guiding
patterns for directed self-assembly (DSA) of block copolymers (BCP). The two key steps of …

The directed self-assembly (DSA) of block copolymers (BCPs) has attracted considerable
attention due to the outstanding ability of this method to complement or replace the …

Directed self-assembly (DSA) of block copolymers (BCPs) is a promising technology for
advanced patterning at future technology nodes, but significant hurdles remain for …